Fast Prototyping of Microfluidic Systems

The picture shows a microfluidic system fabricated by using the dry resist technology.

The technology consists on applying photolithography on a photosensitive layer of dry resist laminated on a substrate. Once the photosensitive layer has been laminated, a positive mask reproducing the layout of the microfluidic system is pressed against the dry resist and this last is shined with UV light to polymerize the unprotected areas. The laminated dry resist is then etched by using specific solvents. The microfluidic network resulting by the etching is sealed by laminating a lid on top of the dry resist.

In particular, the picture shows a microfluidic system having Topas sputtered with gold as substrate and a glass lid containing six holes fabricated by femto second impulse laser.

This technology is very advantageous because it allows a fast prototyping of microfluidic systems, giving the flexibility to choice the more adaptable material as substrate and lid.